The projection system for extreme ultraviolet lithography directly influences whether lithography can be implemented. At present, the projection system for extreme ultraviolet lithography is mostly designed with six-sided mirrors, using high-order aspherical surfaces or freeform surfaces, which have higher requirements for processing and inspection. For the initial structure of the 6-mirror projection system, there are various grouping design methods. We analysis the initial structure obtained by group design based on the design parameters of the extreme ultraviolet lithography projection optical system. The parameters are calculated using MATLAB and the initial structure of the projection system is obtained by ZEMAX or CODE V.

Гао Ш. (науч. рук. Цыганок Е.А.) Extreme ultraviolet lithography projection system design based on grouping and graphical user interface // Сборник тезисов докладов конгресса молодых ученых. Электронное издание. – СПб: Университет ИТМО, [2025]. URL: https://kmu.itmo.ru/digests/article/14362