The Offner relay system was attempted to be used as an illuminator in extreme ultraviolet lithography optical systems. Starting with the basic Offner relay system try to optimize, tilt, use aspherical and free-form surfaces, analyze the system aberration and other parameters. Analyze how to incorporate compensators into the system. To conclude, the feasibility of the Offner relay system as an extreme ultraviolet lithography illuminator is analyzed.
Гао Ш. (науч. рук. Цыганок Е.А.) Offner-relay system for EUV lithography illumination // Сборник тезисов докладов конгресса молодых ученых. Электронное издание. – СПб: Университет ИТМО, [2024]. URL: https://kmu.itmo.ru/digests/article/12900