Illuminators are an essential part of EUV projection lithography. Its main function is to change the distribution of the light source radiation so that the EUV beam can evenly illuminate the mask. At present, commercial extreme ultraviolet lithography uses a compound eye relay system, but new design ideas for illuminator have also emerged. In this article, the design method and processing difficulty of these illuminators will be compared.
Гао Ш. (науч. рук. Цыганок Е.А.) Comparative review of illuminators for EUV projective optical system // Сборник тезисов докладов конгресса молодых ученых. Электронное издание. – СПб: Университет ИТМО, [2023]. URL: https://kmu.itmo.ru/digests/article/10381